- Advisory Committee

Company Profile

HOLO/OR   Ltd., from its inception in 1989, has set as its goal to develop and manufacture diffractive and micro-optical elements for the optics industry. HOLO/OR is located at the Kiryat Weizmann High Tech Industrial Park, next to the Weizmann Institute of Science in Rehovot, Israel.

Optical Design

Diffractive Optical Design:

• HOLO/OR gained over the last two decades vast experience in designing and developing diffractive optical elements (DOE).
• Using our in house software and algorithms, our designs reach top quality in terms of efficiency, uniformity and other required parameters.
• HOLO/OR now holds an extensive multifunctional design database, enabling us to give fast solutions for different applications and customer needs.
• Integrating manufacturing tolerances into the diffractive design enables us to keep simulated quality after manufacturing.

Optical Systems design: In addition to our diffractive design capabilities, HOLO/OR designs both refractive optical systems and hybrid refractive/diffractive systems.

Special R&D projects and tailored optics: HOLO/OR has wide experience in managing R&D projects in different areas and applications including special diffractive patterns, diffractive eyeglasses and medical applications. Our multidisciplinary R&D team is highly qualified to meet any challenge in the field of optics and computer science.

DOE Fabrication

Photolithographic DOE fabrication-Includes mask fabrication and alignment, coating and development of photo resist, wet and RIE etching of a variety of materials and measurement capabilities of surface profiles and shapes. Know-how is based on long-term experience and experiments with chemical and physical processes, many of which have no known mathematical characterization. Know-how includes proprietary optimized parameters and processes that make the etching technology feasible for DOE manufacturing.

Mask Design and Fabrication- This includes translation of the optical design parameters of the DOE to mask design, once the photolithographic process is selected. HOLO/OR's mask design know-how includes proprietary algorithms for optimization of the design, proprietary software compatible with mask fabrication machine software e.g. Postscript, GDSII etc. HOLO/OR has well-established access to leading mask manufacturers that use high-resolution laser plotters and E-beam machines

Other

Optical Measurements -Holo/Or offers a valuable service for the customer with maesurement capabilities of various system parameters. After receiving from a customer the specified dada of interest, we will design and build an effective set-up to measure the data requested, and normally, we will also perform the measurements in-house. If you have a clear description of how to measure the data you need, we propose to build the set-up in our lab and use our in-house advanced equipment to perform accurate and well-documented measurements.

Major equipment and facilities:
- Photolithographic Lab
- Clean Room
- Reactive Ion Etching (RIE) Facility
- UV-VIS-NIR Spectrometers with Integrating
  spheres
- UV/VIS/NIR/IR lasers and light sources
- Profilometers
- Power meters, Beam analyzers
- Large stock of unique Diffractive and Refractive UV-VIS-NIR-IR optics