HOLO/OR Ltd.manufactures, develops and designs diffractive and micro-optical elements, since 1989. Our FAB, laboratories and offices are located in the Kiryat Weizmann High Tech Industrial Park, next to the Weizmann Institute of Science in Rehovot, Israel.
Our capabilities include:
Diffractive Optical Design:
- HOLO/OR gained, over the last three decades, vast experience in designing and developing diffractive optical elements (DOE) and other solution for laser beam shaping. Using our in house software and algorithms, our designs reach top quality in terms of efficiency, uniformity and other required parameters.
- HOLO/OR holds an extensive multifunctional design database, enabling us to give fast solutions for different applications and customer needs.
- Integrating manufacturing tolerances into the diffractive design enables us to predict the actual performance after manufacturing tolerances.
Optical Systems design: In addition to the mentioned diffractive designs, HOLO/OR also designs both refractive optical systems and hybrid refractive/diffractive systems.
Special R&D projects and tailored optics: HOLO/OR has a broad experience in managing R&D projects in different areas and applications, for example diffractive eyeglasses, endoscopy, Material processing, Metrology, Aesthetical and Medical applications. Our multidisciplinary R&D team is highly qualified to meet any challenge in the field of optics and computer science.
Photolithographic DOE fabrication: Includes direct laser writing with high accuracy alignment, coating and development of photo resist, dry plasma etching of a variety of materials with steep side walls, and measurement capabilities of surface profiles and shapes. Our Know-how is based on long-term experience and experiments with chemical and physical processes, using mathematical characterization and proprietary optimization of parameters and processes. This all enables us to produce high quality diffractive optical elements (DOE’s) with absolute angular accuracy.
Design for production and Fabrication: This includes creating a phase mask to be written from the optical design parameters . The designed phase mask is then manufactured using a laser writing lithography process followed by dry plasma etching. HOLO/OR ‘s mask design know-how includes proprietary algorithms for optimization of the design and proprietary software compatible with mask fabrication machine software e.g. GDSII, DXF etc.. HOLO/OR has state-of-the-art high resolution machines capable of writing fine diffractive structures at high densities, as required.
High laser damage threshold: Our High Power DOE’s are structure etch directly into pure Fused Silica or ZnSe substrate.
Therefore, after the end of manufacture there are no foreign materials present. Substrated are cleaned by both mechanical-solvent processes and Plasma Ashing, to insure the highest quality and laser damage resistance The most popular optical materials offered include, Fused Silica (both high quality UV grade and Corning 7979) and Zinc Selenide . This enables to reach the highest laser damage threshold in the industry. As a part of the European FP7 project we confirmed this with extremely high power picosecond lasers, and have also verified this in external LDT tests at LIDARIS.
QA and Testing
Our elements are modules are manufactured and tested in-house. Holo/OR tests both the surface topography and the optical performance of products, with our own custom-built test setups featuring lasers at wavelength fron the UV to the MIR. We employ stringent quality assurance to meet and exceed our customers specs, including S/D definition, optical performance and coating specifications.
All cleaning and packaging is done in a clean environment and each element is individually inspected before packing to ensure quality. grating